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Pure Sputter Targets by HpCold Spray
ASB Industries Research Facility has produced Sputter Targets using the High Pressure Cold Spray Process(HpCS).
Various shapes and sizes of different materials, including Tantalum, Titanium, Niobium, Silver, Copper and MMCs have been produced (Figure B). HpCS produced sputter targets can be used in almost any thin film application such as semiconductor, optical, superconductivity and electrical/thermal contacts. HpCS produces highly dense, homogeneous, phase-pure and strongly adherent coatings (Figure C). Sputter targets also exhibit exceptional electrical and thermal conductivity with values near or almost equivalent to bulk materials. Hence, HpCS sputter targets have shown superior yield, resulting in higher efficiency and enhanced film properties. Sputtered thin films, using HpCS have shown excellent optical, semi conducting and superconducting characteristics (Figure D).
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